PENGARUH TEMPERATUR TERHADAP LAJU KOROSI LOGAM AA 5052 TERLAPIS INHIBITOR KITOSAN MENGGUNAKAN TEKNIK ELEKTRODEPOSISI

MUHAMMAD, WAHYU (2019) PENGARUH TEMPERATUR TERHADAP LAJU KOROSI LOGAM AA 5052 TERLAPIS INHIBITOR KITOSAN MENGGUNAKAN TEKNIK ELEKTRODEPOSISI. S1 thesis, Universitas Mercu Buana Jakarta.

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Abstract

AA 5052 has high thermal and electrical conductivity, low production costs and light weight so it can be used in various things such as Proton Exchange Membrane Fuel Cell (PEMFC) bipolar plate. AA 5052 has corrosion resistance because it has an oxide layer that inhibits corrosion reactions, but this layer will disappear along with a very corrosive environment and increased temperature. Inorganic inhibitors such as chromate and arsenic can be used to inhibit corrosion processes, but their use can damage the environment. In this study, environmentally friendly chitosan organic inhibitors will be used. The use of chitosan as a corrosion inhibitor of AA 5052 metal with chitosan using electrophoretic deposition techniques. During immersion for 168 hours in 0.5 M H2SO4 solution, the corrosion rate of AA 5052 without inhibitor layer was 0.1702 mg cm-2 h-1. With an electrophoretic deposition process for 20 minutes, the corrosion rate of AA 5052 metal coated with chitosan inhibitor was 0.0552 mg cm-2 h-1. The increase of temperature 0.5 M H2SO4 solution can decrease chitosan inhibitor protection. AA 5052 metal with chitosan inhibitor layer has a corrosion rate of 0.25 mg cm-2 h-1at a temperature of 298 K, while at a temperature of 353 K, the corrosion rate increases to 1.38 mg cm-2 h-1. Based on potentiodynamic polarization tests, chitosan are mixed inhibitors with dominant protection in the cathodic region. Based on SEM-EDX (Scanning Electron Microscopy - Energy Dispersive X-Ray Spectrometer) test, elements of C, N, and O were adsorbed on the surface of AA 5052 after electrophoretic deposition using chitosan. Morphological observations using SEM (Scanning Electron Microscopy) test, showed the surface of AA 5052 coated with chitosan inhibitor was more smooth and homogeneous than the surface of AA 5052 without chitosan inhibitor after 168 hours of immersion and 2 hours immersion with temperature of 353 K. Keywords: AA 5052, corrosion, chitosan, electrophoretic deposition technique, temperature effect Logam AA 5052 memiliki konduktivitas termal dan elektrik yang tinggi, biaya produksi yang rendah dan bobotnya yang ringan sehingga dapat digunakan pada berbagai bidang misalnya sebagai bipolar plate Proton Exchange Membrane Fuel Cell (PEMFC). Logam AA 5052 memiliki ketahanan terhadap korosi karena memiliki lapisan oksida yang menghambat reaksi korosi, namun lapisan ini akan hilang seiring pada lingkungan yang sangat korosif dan meningkatnya temperatur. Inhibitor anorganik seperti kromat dan arsenik dapat digunakan untuk menghambat proses korosi, namun penggunaanya dapat merusak lingkungan. Pada penelitian ini akan digunakan inhibitor organik kitosan yang ramah lingkungan. Penggunaan kitosan sebagai inhibitor korosi logam AA 5052 dengan kitosan menggunakan teknik elektrodeposisi. Pada perendaman selama 168 jam dalam larutan 0,5 M H2SO4, laju korosi logam AA 5052 tanpa lapisan inhibitor sebesar 0,1702 mg cm-2 jam-1. Dengan proses elektrodeposisi selama 20 menit, laju korosi logam AA 5052 terlapis inhibitor kitosan sebesar 0,0552 mg cm-2 jam-1. Kenaikan temperatur larutan 0,5 M H2SO4 dapat menurunkan proteksi inhibitor kitosan. Logam AA 5052 dengan lapisan inhibitor kitosan memiliki laju korosi sebesar 0,25 mg cm-2 jam-1 pada temperatur 298 K, sedangkan pada temperatur 353 K, laju korosi meningkat menjadi 1,38 mg cm-2 jam-1. Berdasarkan uji polarisasi potensiodinamik, inhibitor kitosan bersifat campuran dengan proteksi dominan di daerah katodik. Berdasarkan uji SEM-EDX (Scanning Electron Microscopy - Energy Dispersive X-Ray Spectrometer), unsur C, N, dan O teradsorpsi pada permukaan logam AA 5052 setelah dilakukan proses elektrodeposisi menggunakan kitosan. Pengamatan morfologi menggunakan uji SEM (Scanning Electron Microscopy), menunjukkan permukaan logam AA 5052 terlapis inhibitor kitosan lebih halus dan homogen dibandingkan permukaan logam AA 5052 tanpa lapisan inhibitor setelah dilakukan perendaman selama 168 jam maupun perendaman selama 2 jam dengan temperatur 353 K. Kata Kunci: AA 5052, korosi, kitosan, teknik elektrodeposisi, pengaruh temperatur

Item Type: Thesis (S1)
NIM: 41313110080
Uncontrolled Keywords: AA 5052, korosi, kitosan, teknik elektrodeposisi, pengaruh temperatur
Subjects: 600 Technology/Teknologi > 660 Chemical Engineering and Related Technologies/Teknologi Kimia dan Ilmu yang Berkaitan > 669 Metallurgy/Metal, Metalurgi > 669.1 Ferrous Metals/Metalurgi Logam Besi dan Baja
600 Technology/Teknologi > 670 Manufacturing/Manufaktur, Pabrik-pabrik > 673 Nonferrous Metals Process/Pabrik Logam Bukan Besi > 673.7 Other Nonferrous Metals/Logam yang Mengandung Besi Lainnya
600 Technology/Teknologi > 690 Buildings/Teknik Bangunan
600 Technology/Teknologi > 690 Buildings/Teknik Bangunan > 691 Building Material/Material Bangunan
600 Technology/Teknologi > 690 Buildings/Teknik Bangunan > 691 Building Material/Material Bangunan > 691.7 Ferrous Metals/Bahan Bangunan dari Logam Besi dan Baja
600 Technology/Teknologi > 690 Buildings/Teknik Bangunan > 693 Construction In Specific Types of Materials and For Specific Purposes/Konstruksi Dalam Jenis Bahan Khusus dan Untuk Tujuan Khusus
600 Technology/Teknologi > 690 Buildings/Teknik Bangunan > 693 Construction In Specific Types of Materials and For Specific Purposes/Konstruksi Dalam Jenis Bahan Khusus dan Untuk Tujuan Khusus > 693.7 Metals/Logam
700 Arts/Seni, Seni Rupa, Kesenian > 740 Drawing and Decorative Art/Menggambar dan Seni Dekorasi > 745 Decorative Arts/Seni Dekorasi > 745.5 Handicrafts/Kerajinan Tangan, Keterampilan Tangan, Seni Terampil, Seni Kreatif > 745.56 Metals/Logam
Divisions: Fakultas Teknik > Teknik Mesin
Depositing User: Dede Muksin Lubis
Date Deposited: 29 Jan 2019 03:51
Last Modified: 29 Jan 2019 03:51
URI: http://repository.mercubuana.ac.id/id/eprint/46957

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